Ultra-thin and nano-structured films have become important elements of present-day optics and opto-electronics or photonics. Intense research is proceeding on active opto-electronic elements consisting of ultra-thin films, also with optically active individual molecules.

As latest examples of novel light-emitting substances, semiconductor nano-cluster for Si-based light emission and organic light-emitting diodes may be mentioned.

X-ray mirrors consisting of stacks of ultra-thin films of a few nm thickness are increasingly applied as beam shaping elements in analytics. Still higher precision of X-ray optical elements is required in EUV ((?)) -lithography, which is thought to be the most promising future lithographic technique. This requires further perfection of deposition techniques and of ultra-smooth substrate manufacture.

Head of the working group:

Prof. Dr. Karl Leo